Helium ion beam (HIB) technology plays an important role in the extreme fields of nanofabrication. Due to high resolution and sensitivity, HIB nanofabrication technology is widely used to pattern nanostructures into components, devices, or systems in integrated circuits, materials sciences, nano-optics, and bio-sciences applications. HIB-based nanofabrication includes direct-write milling, ion beam-induced deposition, and direct-write lithography without the need to resist assistance. Their nanoscale applications have also been evaluated in the areas of integrated circuits, materials sciences, nano-optics, and biological sciences.
In a new paper published in the International Journal of Extreme Manufacturing, a team of researchers, led by Dr. Deqiang Wang from Chongqing Key Laboratory of Multi-scale Manufacturing Technology, Chongqing Institute of Green and Intelligent Technology, Chinese Academy of Sciences, PR China, have summarized comprehensively the extreme processes and applications of HIB nanofabrication.
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