Researchers at North Carolina State University have developed a new technique for creating high-quality semiconductor thin
films at the atomic scale – meaning the films are only one atom thick. The technique can be used to create these thin films on a large scale, sufficient to coat wafers that are two inches wide, or larger.
“This could be used to scale current semiconductor technologies
down to the atomic scale – lasers, light-emitting diodes (LEDs), computer chips, anything. People have been talking about this concept for a long time, but it was not possible. With this discovery, I think it is possible,” said Dr. Linyou Cao, an assistant professor of materials science and engineering at NC State and senior author of a paper on the work.