A team of Israeli scientists has announced fabricating the world's tiniest technology - an atomically thin film that is only two atoms thick. The new technology is intended to store electric information using one of the most stable and inert materials naturally available.
The researchers in the new breakthrough are from the Raymond and Beverly Sacker School of Physics and Astronomy and the Raymond and Beverly Sacker School of Chemistry from Tel Aviv University in Israel. Their work, titled "Interfacial ferroelectricity by van der Waals sliding," appears in the latest online issue of the Science journal.
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